Filter Fits New And Existing Cartridge Dust Collectors

Aug. 3, 2010
The HemiPleat Nano media is strong enough to handle difficult dust challenges.

A new HemiPleat Nano dust collector filter from Camfil Farr Air Pollution Control uses a new technology to apply a thick layer of highly durable nano fibers to the surface of the HemiPleat filter, yielding a MERV 14 efficiency.

The HemiPleat Nano media is strong enough to handle difficult dust challenges, such as laser and plasma cutting and welding and thermal spray. It will withstand rigorous pulse cleaning for all types of dry-dust applications, bringing longer service life and lower operational costs. The product line includes MERV 14 and MERV 16 efficiency options, with a choice of high performance standard or fire retardant cellulose-blend base media.

The new filter is also the only one to combine nano media with HemiPleat’s open-pleat design. Open-pleat spacing allows better utilization of the media pack, resulting in better airflow through the cartridge for more efficient performance. Dust also releases more readily during pulse cleaning, using less compressed air for many applications. All HemiPleat filters carry a written performance guarantee to run at a lower pressure drop, meet or exceed current collection efficiencies and last longer.

HemiPleat Nano filters are available to fit all types of new and existing cartridge dust collectors.

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