Rockwell Automation Introduces Project Scio Scalable Analytics Platform For IIoT

Jan. 4, 2018
The platform opens access to ad-hoc analytics and performs advanced analysis by pulling structured and unstructured data from existing sources in the enterprise.

The Project Scio platform from Rockwell Automation reportedly reduces hurdles to unleashing information. The platform opens access to ad-hoc analytics and performs advanced analysis by pulling structured and unstructured data from existing sources in the enterprise. It can also intelligently fuse related data, delivering analytics in intuitive dashboards – called storyboards – that users can share and view. Users then have the ability to perform self-serve drill downs to make better decisions.

Key attributes of Project Scio include the following:

Device Auto-Discovery: Manually mapping software to each plant-floor device can be a time-consuming and error-prone process. The platform can auto-discover Rockwell Automation devices and tags, as well as third-party device data, to save time and help reduce risk. Additionally, the auto-discovery process gives users access to more detailed information than is typically available through manual mapping, such as device name, line location and plant location.

Leave Isolated Analytics Behind: Rather than leave data at its source and take database snapshots, the platform brings data into a centralized location and can continually refresh that data. Additionally, connections to data sources only need to be established once. This connection allows users to create custom analytics and refresh them at their preferred rate without the support of a data scientist.

Flexible Machine Learning (ML): Use the right ML algorithm for the right use case. The Project Scio platform is configurable to support many industry-leading algorithms, including SparkML, MLLib and Python.

Closed-Looped Analytics: Using either ML or predefined settings, the platform can monitor operations and automatically trigger control adjustments if processes start to fall outside allowable parameters. This can help users optimize control, improve product quality and consistency, and reduce scrap and waste.

Applications Marketplace: Rockwell Automation will introduce an applications marketplace for applications developed in-house and by third parties. The ability to access any data source and create custom analytics for each user’s application is a central feature. However, users can also take advantage of pre-engineered FactoryTalk Analytics applications from Rockwell Automation. These applications allow users to monitor common KPIs, such as OEE and quality, in a standardized way and without any configuration.

Open Platform: Industrial producers cannot be expected to rip and replace all their legacy control and information systems before gaining value from analytics. This scalable and open-architecture platform is designed to be extended to a full ecosystem of IIoT data sources. The quick connection to the full range of systems that feed data into a Connected Enterprise includes controllers, MES software and edge devices.