W. L. Gore & Associates (Gore) recently announced an addition to their line of high-performance cartridge filters for semiconductor applications. The new 40nm-rated filter, intended for use with chemicals in wet processes and distribution systems, provides 40nm retention while maintaining the flow of next-best-in-class 50nm filters.
GORE Filters enable semiconductor fabs to realize both improved performance and lower cost of ownership. The drop-in substitution of GORE Filters can upgrade retention performance and reduce particle counts while maintaining desired flow rate, as well as enable reduced processing times, higher flow rates and faster bath turnovers.
GORE Filters incorporate Gore’s proprietary high-flow ePTFE (expanded polytetrafluoroethylene) filtration media. Gore is the inventor of ePTFE and the world technical leader in engineering PTFE materials. Gore technology has been used for decades in the world’s best-performing filters for semiconductor, electronics, high-purity chemical and pharmaceutical applications.
