Two Win DowDuPont Lavoisier Medal For Technical Achievement

By Chemical Processing Staff

Oct 20, 2017

DowDuPont Specialty Products Division awards Mick Ward and Tom Carney with the 2016 Lavoisier Medal of Technical Achievement. The Lavoisier Medal for Technical Achievement is the company’s highest honor. It recognizes scientists and engineers who have demonstrated a career of creative technical contributions. The medal is named in honor of the 18th-century French chemist, Antoine Laurent Lavoisier, who is reportedly considered the father of modern chemistry and served as mentor to DuPont company founder, Eleuthère Irénée du Pont.

“Science-based innovation is at the core of who we are as a company,” says DowDuPont Specialty Products Division Chief Technology & Sustainability Officer Alexa Dembek. “Like the Medal’s namesake, these individuals have paved the way for others to create innovative solutions that make a difference in the world. It is a privilege to honor both Mick and Tom with Lavoisier Medals.”

Lavoisier Medalists are honored with a bronze likeness that is housed at the DuPont Experimental Station in Wilmington, Delaware. DowDupont honored the 2016 Medalists for their lifetime of contributions:

Mick Ward (Palo Alto, California), DuPont Fellow, is an outstanding scientist with an incredibly successful track record of contributions in Industrial Biosciences. Ward is the lead developer of DuPont’s filamentous fungal expression systems used to produce a wide range of enzyme and protein products and serves as the global adviser for the company in this field.

Tom Carney (Circleville, Ohio), Senior Research Fellow, is an outstanding leader in Electronics and Imaging. Carney’s efforts have resulted in several new product platforms, including black DuPont Kapton polyimide film for use in flexible printed circuits for consumer electronics, and he serves as a strong mentor to junior scientists and peers in several critical areas.

For more information, visit: www.dow-dupont.com

 

 

 

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