2011 Chem Show To Feature Latest Process Control Technologies

By Chemical Processing Staff

Jul 14, 2011

Control and automation companies will unveil the latest innovations in process control systems, wireless monitoring devices, data collection, instrumentation, sensors and transmitters during the 2011 Chem Show. The conference will take place at the Jacob K. Javits Convention Center in New York Nov. 1-3.

Dozens of the leading control and automation companies from around the world, including Honeywell and A-T Controls, will showcase their latest products and technology solutions to thousands of chemical processing professionals in the Process Control & Automation Center during the three-day exposition and conference.

More than 400 exhibiting companies will display their new products and solutions to more than 5,000 attendees from approximately 50 countries throughout the show floor.

Emerging technologies companies will display include process control and automation solutions, water/wastewater treatment and energy-saving solutions.

In addition to the activity on the show floor, The American Institute of Chemical Engineers (AIChE) is developing a solutions-focused conference program. The multifaceted, three-day program will address a wide range of critical industry topics ranging from such new developments as nanotechnology to technical sessions on powder and bulk processing.

For more information, visit http://www.chemicalprocessing.com/chem_show/

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